Paul Hurley
University College Cork National University of Ireland
205 papers found
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Navigation aids in the search for future high-k dielectrics: physical and electrical trends
Download from www.researchgate.netImpact of H2/N2 annealing on interface defect densities in Si(100)/SiO2/HfO2/TiN gate stacks
Download from www.researchgate.netPulsed liquid-injection MOCVD of high-K oxides for advanced semiconductor technologies
Download from www.researchgate.netInterface of ultrathin HfO2 films deposited by UV-photo-CVD
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