Jorge Kittl
Samsung Semiconductor Inc USA
197 papers found
Refreshing results…
Thickness scaling issues of Ni silicide
Download from www.researchgate.netNi and Co-based silicides for advanced CMOS applications
Download from www.researchgate.netA comparison of spike, flash, SPER and laser annealing for 45nm CMOS
UploadMissing publications? Search for publications with a matching author name.