Luc Stafford
0000-0003-0647-543X
137 papers found
Refreshing results…
Development of Thin Film and Nanorod ZnO-Based LEDs and Sensors
Novel Thermally Stable Contacts to GaN
Schottky barrier height of boride-based rectifying contacts to p-GaN
Influence of ion mixing on the energy dependence of the ion-assisted chemical etch rate in reactive plasmas
Ion mass dependence of the etch yield of SrTiO3 films in reactive plasmas
Microfabricated SrTiO3 ridge waveguides
Growth, Characterization and Processing of VO2 Thin Films for Micro-switching Devices
Comment on “Plasma etching of high dielectric constant materials on silicon in halogen plasma chemistries” by L. Sha and J. P. Chang [J. Vac. Sci. Technol. A 22, 88 (2004)]
Influence of the Microstructure on the Optical Characteristics of SrTiO3 thin films
Kinetics driving high-density chlorine plasmas
Energy dependence of ion-assisted chemical etch rates in reactive plasmas
Dependence of the sputter-etching characteristics of strontium–titanate–oxide thin films on their structural properties
Growth and patterning of strontium-titanate-oxide thin films for optical devices applications
Barium–strontium–titanate etching characteristics in chlorinated discharges
Characterization of neutral, positive, and negative species in a chlorine high-density surface-wave plasma
Sputter-etching characteristics of barium–strontium–titanate and bismuth–strontium–tantalate using a surface-wave high-density plasma reactor
Propagation of surface waves in two-plasma systems bounded by a metallic enclosure
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