Claire Carmalt
iris.ucl.ac.uk
0000-0003-1788-6971
University College London
192 papers found
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Gallium and Indium β-Diketonate Complexes: AACVD of [In(thd)3] and the Attempted Synthesis of Gallium and Indium Bis(β-diketonates)
Novel ion pairs obtained from the reaction of titanium(IV) halides with simple arsane ligands
The use of combinatorial aerosol-assisted chemical vapour deposition for the formation of gallium-indium-oxide thin films
Titanium arsenide films from the atmospheric pressure chemical vapour deposition of tetrakisdimethylamidotitanium and tert-butylarsine
Atmospheric Pressure Chemical Vapour Deposition of TiCl4 and tBuAsH2 to Form Titanium Arsenide Thin Films
Atmospheric pressure chemical vapour deposition of NbSe2–TiSe2 composite thin films
Syntheses, X-ray structures and CVD of titanium(iv) arsine complexes
MOCVD of crystalline Bi2O3 thin films using a single-source bismuth alkoxide precursor and their use in photodegradation of water
Synthesis of Zirconium Guanidinate Complexes and the Formation of Zirconium Carbonitride via Low Pressure CVD
The reaction of tin(iv) iodide with phosphines: formation of new halotin anions
Atmospheric pressure chemical vapour deposition of SnSe and SnSe2 thin films on glass
Syntheses, X-ray structures and CVD studies of diorganoalkoxogallanes
Reactivity of ZrCl4 and HfCl4 with silylamines and thermal decomposition of the compounds [MCl4{NH(R)(SiR′3)}] (M=Zr, Hf, R=tBu, R′=Me; R=SiR′3=SiMe3, SiMe2H)
Dimethylalkoxygallane incorporating a donor-functionalised alkoxide: The monomeric gas-phase structure
Chromium oxyselenide solid solutions from the atmospheric pressure chemical vapour deposition of chromyl chloride and diethylselenide
Gallium oxide thin films from the AACVD of [Ga(NMe2)3]2 and donor functionalised alcohols
Synthesis and structures of gallium alkoxides
Tungsten imido complexes as precursors to tungsten carbonitride thin films
Synthesis and Charaterisation of Chromium Oxyselenide (Cr2Se0.7O2.3) Formed from Chemical Vapour Synthesis: A New Antiferromagnet
Atmospheric pressure chemical vapour deposition of vanadium diselenide thin films
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