Papers authored by R. G. Elliman
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Avi Shalav,
Robert Elliman ,
Andrew Blakers
The effect of annealing ambient on carrier recombination in boron implanted silicon
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R. G. Elliman
Effect of Microstructure on Dielectric Breakdown in Amorphous HfO2 Films
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Graphene synthesis by C implantation into Cu foils
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Robert Elliman ,
Andrew Blakers
Influence of Implantation Damage on Emitter Recombination
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Dougal G. McCulloch,
Rg G. Elliman
Formation of ordered arrays of gold particles by nanoindentation templating
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D. K. Venkatachalam,
S. K. Nandi,
R. G. Elliman
Determination of thickness and composition of high-k dielectrics using high-energy electrons
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Volatile CuOH as a precursor for the growth of CuO nanowires
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J. C. McCallum
Temperature dependence of blistering in hydrogen implanted Si and Ge
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M. N. Saleh,
M. S. Saleh,
T.-H. Kim,
S. H. Kim,
D. K. Venkatachalam,
K. Belay,
S. Ruffell,
P. Kurunczi,
J. England
Application of ion-implantation for improved non-volatile resistive random access memory (ReRAM)
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A. A. Volinsky
Ion Beam-mixed Ge Electrodes for High Capacity Li Rechargeable Batteries
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J. L. Gomez ,
J. L. Gomez Selles,
R. G. Elliman ,
K. S. Jones
Substrate orientation dependence on the solid phase epitaxial growth rate of Ge
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