Published in
Royal Society of Chemistry, Dalton Transactions, 18(46), p. 5790-5795, 2017
DOI: 10.1039/c6dt02572b
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Atomic layer deposition of Cu(i) oxide films using Cu(ii) bis(dimethylamino-2-propoxide) and water
Journal article published in 2017 by
J. R. Avila 
,
A. W. Peters,
Zhanyong Li ,
M. A. Ortuño,
A. B. F. Martinson ,
C. J. Cramer,
J. T. Hupp,
O. K. Farha
,
A. W. Peters,
Zhanyong Li ,
M. A. Ortuño,
A. B. F. Martinson ,
C. J. Cramer,
J. T. Hupp,
O. K. Farha
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Abstract
To grow films of Cu2O, bis-(dimethylamino-2-propoxide)Cu(ii), or Cu(dmap), is used as an atomic layer deposition precursor using only water vapor as a co-reactant.