Published in
Royal Society of Chemistry, Journal of Analytical Atomic Spectrometry, 1(27), p. 71-79
DOI: 10.1039/c1ja10235d
Links
Tools
Influence of the hydrogen contained in amorphous silicon thin films on a pulsed radiofrequency argon glow discharge coupled to time of flight mass spectrometry. Comparison with the addition of hydrogen as discharge gas
Journal article published in 2012 by
Pascal Sánchez,
Deborah Alberts,
Beatriz Fernández,
Armando Menéndez,
Rosario Pereiro 
,
Alfredo Sanz-Medel
,
Alfredo Sanz-Medel
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
Published version:
archiving forbidden
Data provided by 