Published in
Royal Society of Chemistry, Journal of Materials Chemistry C Materials for optical and electronic devices, 22(1), p. 3544, 2013
DOI: 10.1039/c3tc30300d
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Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design
Journal article published in 2013 by
Mathieu Salaun,
Marc Zelsmann,
Sophie Archambault,
Dipu Borah,
Nikolaos Kehagias,
A. Francone,
Claudia Simao,
Olivier Lorret,
B. Kosmala,
Matthew T. Shaw,
M. T. Shaw,
Clivia M. Sotomayor Torres 
,
C. M. Sotomayor Torres,
M. A. Morris,
Mickael A. Morris
,
C. M. Sotomayor Torres,
M. A. Morris,
Mickael A. Morris
This paper is available in a repository.
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