Published in
American Institute of Physics, Journal of Applied Physics, 6(104), p. 064113
DOI: 10.1063/1.2978209
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Electrical, structural, and chemical properties of HfO(2) films formed by electron beam evaporation
Journal article published in 2008 by
K. Cherkaoui,
S. Monaghan,
M. A. Negara,
M. Modreanu 
,
P. K. Hurley ,
D. O'Connell,
S. McDonnell,
G. Hughes,
S. Wright,
R. C. Barklie,
P. Bailey,
T. C. Q. Noakes
,
P. K. Hurley ,
D. O'Connell,
S. McDonnell,
G. Hughes,
S. Wright,
R. C. Barklie,
P. Bailey,
T. C. Q. Noakes
This paper is available in a repository.
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