Published in

Royal Society of Chemistry, Chemical Communications, 7(49), p. 677-679, 2013

DOI: 10.1039/c2cc36747e

Links

Tools

Export citation

Search in Google Scholar

Selective surface functionalization at regions of high local curvature in graphene

Journal article published in 2012 by Qingzhi Wu, Yaping Wu, Yufeng Hao, Jianxin Geng, Matthew Charlton, Shanshan Chen, Yujie Ren, Hengxing Ji, Huifeng Li, Danil W. Boukhvalov, Richard D. Piner, Christopher W. Bielawski, Rodney S. Ruoff
This paper is available in a repository.
This paper is available in a repository.

Full text: Download

Green circle
Preprint: archiving allowed
Upload
Orange circle
Postprint: archiving restricted
Upload
Red circle
Published version: archiving forbidden
Policy details
Data provided by SHERPA/RoMEO

Abstract

Monolayer graphene was deposited on a Si wafer substrate decorated with SiO(2) nanoparticles (NPs) and then exposed to aryl radicals that were generated in situ from their diazonium precursors. Using micro-Raman mapping, the aryl radicals were found to selectively react with the regions of graphene that covered the NPs. The enhanced chemical reactivity was attributed to the increased strain energy induced by the local mechanical deformation of the graphene.