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Royal Society of Chemistry, Lab on a Chip, 14(9), p. 1994

DOI: 10.1039/b904769g

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Laminar flow used as “liquid etch mask” in wet chemical etching to generate glass microstructures with an improved aspect ratio

Journal article published in 2009 by Xuan Mu ORCID, Qionglin Liang, Ping Hu, Kangning Ren, Yiming Wang, Guoan Luo
This paper is available in a repository.
This paper is available in a repository.

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Abstract

A new method of anisotropic etching an amorphous bulk material is proposed in this paper. Laminar flow is employed in this method to mask the flow of an etchant and is termed as "liquid etch mask". Since this mask has the physical properties of a liquid, it brings several advantages that could not be achieved by any kind of other etch mask in the solid phase. As a consequence, the aspect ratio of the glass channel could be improved to approximately 1 while in an inexpensive and convenient manner.