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Royal Society of Chemistry, Physical Chemistry Chemical Physics, 27(17), p. 17821-17827, 2015

DOI: 10.1039/c5cp01561h

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Chemically induced porosity on BiVO4 films produced by double magnetron sputtering to enhance the photo-electrochemical response

This paper is available in a repository.
This paper is available in a repository.

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Abstract

Double magnetron sputtering (DMS) is an efficient system that is well known because of its precise control ofthe thin film synthesizing process over any kind of substrate. Here, DMS has been adopted to synthesize BiVO4 films over a conducting substrate (FTO), using metallic Vanadium and ceramic Bi2O3 targets simultaneously. The films were characterized using different techniques, such as X ray diffraction (XRD), diffuse reflectance spectroscopy, Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), field emission scanning electron microscopy (FESEM) and Profilometry. The photo-electrochemical analysis was performed by linear scan voltammetry, chrono-amperometry and electrochemical impedance spectroscopy under the illumination of simulated solar light maintained at 1sun. The importance of this paper resides in the synthesis of thin uniform porous films of BiVO4 using DMS, which can produce a photocurrent density of 1.19mA at 1.23 V vs RHE. Details of the characteristics of the films are given in relation to the activity.