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Trans Tech Publications, Solid State Phenomena, (205-206), p. 181-190, 2013

DOI: 10.4028/www.scientific.net/ssp.205-206.181

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The Trivacancy and Trivacancy-Oxygen Family of Defects in Silicon

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Data provided by SHERPA/RoMEO

Abstract

The data obtained recently from combined deep-level-transient spectroscopy (DLTS), local vibrational mode (LVM) spectroscopy and ab-initio modeling studies on structure, electronic properties, local vibrational modes, reconfiguration and diffusion paths and barriers for trivacancy (V3) and trivacancy-oxygen (V3O) defects in silicon are summarized. New experimental results on the introduction rates of the divacancy (V2) and trivacancy upon 4 MeV electron irradiation and on the transformation of V3 from the fourfold coordinated configuration to the (110) planar one upon minority carrier injection are reported. Possible mechanisms of the transformation are considered and discussed. © (2014) Trans Tech Publications, Switzerland. ; cited By (since 1996)0