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Published in

Royal Society of Chemistry, Nanoscale Horizons, 1(9), p. 132-142, 2024

DOI: 10.1039/d3nh00358b

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Sublimation-based wafer-scale monolayer WS<sub>2</sub> formation via self-limited thinning of few-layer WS<sub>2</sub>

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

We present the use of an in situ self-limited thinning of few-layer WS2 formed by the sulfurization of WOx for the growth of wafer-scale fully-covered monolayer WS2. This thinning approach can also be utilized for the preparation of monolayer MoS2.