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Royal Society of Chemistry, Nanoscale, 22(13), p. 10092-10099, 2021

DOI: 10.1039/d0nr08921d

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Atomic insights into the oxygen incorporation in atomic layer deposited conductive nitrides and its mitigation by energetic ions

Journal article published in 2021 by Saurabh Karwal, Bora Karasulu ORCID, Harm C. M. Knoops, Vincent Vandalon, Wilhelmus M. M. Kessels ORCID, Mariadriana Creatore ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

Oxygen incorporation from the residual H2O present in the reactor background is a long-standing issue in transition metal nitride films. Energetic ions can abstract H2O from surface and later radicals reduce the metal atom to +3 oxidation state.