Published in

IOP Publishing, Nanotechnology, 49(32), p. 495203, 2021

DOI: 10.1088/1361-6528/ac1e50

Links

Tools

Export citation

Search in Google Scholar

Interlayer engineering for enhanced ferroelectric tunnel junction operations in HfO <sub>x</sub> -based metal-ferroelectric-insulator-semiconductor stack

This paper is made freely available by the publisher.
This paper is made freely available by the publisher.

Full text: Download

Green circle
Preprint: archiving allowed
Orange circle
Postprint: archiving restricted
Red circle
Published version: archiving forbidden
Data provided by SHERPA/RoMEO