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American Institute of Physics, Applied Physics Letters, 1(120), p. 012901, 2022

DOI: 10.1063/5.0077840

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Impact of interlayer insulator formation methods on HfO<sub>x</sub> ferroelectricity in the metal–ferroelectric–insulator–semiconductor stack

Journal article published in 2022 by Kyung Kyu Min ORCID, Seok Jin Kwon, Yeonwoo Kim, Junsu Yu ORCID, Jong-Ho Lee ORCID, Byung-Gook Park ORCID, Daewoong Kwon ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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