Published in
Institute of Electrical and Electronics Engineers, IEEE Transactions on Electron Devices, 4(69), p. 2088-2093, 2022
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Investigation of Device Performance for Fin Angle Optimization in FinFET and Gate-All-Around FETs for 3 nm-Node and Beyond
Journal article published in 2022 by
Soyoun Kim 
,
Kitae Lee ,
Sihyun Kim ,
Munhyeon Kim ,
Jong-Ho Lee ,
Sangwan Kim ,
Byung-Gook Park
,
Kitae Lee ,
Sihyun Kim ,
Munhyeon Kim ,
Jong-Ho Lee ,
Sangwan Kim ,
Byung-Gook Park
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