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Royal Society of Chemistry, Physical Chemistry Chemical Physics, 31(23), p. 16646-16657, 2021

DOI: 10.1039/d1cp02334a

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Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

Electron-induced reactions make an important contribution to the solubility switch of a novel Zn oxocluster resist in extreme ultraviolet lithography (EUVL). The study also gives direct evidence that chain reactions are involved in this process.