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Royal Society of Chemistry, Journal of Materials Chemistry C Materials for optical and electronic devices, 8(9), p. 2919-2932, 2021

DOI: 10.1039/d0tc03910a

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Reactions of Ruthenium Cyclopentadienyl Precursor in the Metal Precursor Pulse of Ru Atomic Layer Deposition

Journal article published in 2021 by Ji Liu ORCID, Hong-Liang Lu ORCID, David Wei Zhang, Michael Nolan ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

The elimination of Cp ligand on Ru(001) and (100) surfaces have high barriers and the reactions of hydrogen transfer are endothermic. The final terminations are 0.85 RuCp per nm2 on Ru(001) surface and 1.01 (Ru + RuCp2) per nm2 on Ru(100) surface.