Published in

Royal Society of Chemistry, Nanoscale, 5(13), p. 2891-2901, 2021

DOI: 10.1039/d0nr07827a

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Incorporation-limiting mechanisms during nitrogenation of monolayer graphene films in nitrogen flowing afterglows

Journal article published in 2021 by Germain Robert Bigras, Richard Martel ORCID, Luc Stafford ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

Modification of graphene films in the flowing afterglow of microwave N2 plasmas. Nitrogenation is first limited by the formation of defect sites by plasma-generated N and N2(A) at low damage and then by the adsorption of nitrogen atoms at high damage.