Published in
Royal Society of Chemistry, Molecular Systems Design & Engineering, 10(5), p. 1642-1657, 2020
DOI: 10.1039/d0me00118j
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Engineering block copolymer materials for patterning ultra-low dimensions
Journal article published in 2020 by
Cian Cummins 
,
Guillaume Pino,
Daniele Mantione ,
Guillaume Fleury
,
Guillaume Pino,
Daniele Mantione ,
Guillaume Fleury
This paper was not found in any repository, but could be made available legally by the author.
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Abstract
Recently engineered high χ-low N block copolymers for nanolithography are evaluated. Synthetic routes together with thin film processing strategies are highlighted that could enable the relentless scaling for logic technologies at sub-10 nanometres.