Published in
Royal Society of Chemistry, Dalton Transactions, 38(49), p. 13462-13474, 2020
DOI: 10.1039/d0dt02471f
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A new metalorganic chemical vapor deposition process for MoS2 with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur
Journal article published in 2020 by
Jan-Lucas Wree 
,
Engin Ciftyürek ,
David Zanders ,
Nils Boysen ,
Aleksander Kostka ,
Detlef Rogalla ,
Maren Kasischke,
Andreas Ostendorf,
Klaus Schierbaum ,
Anjana Devi
,
Engin Ciftyürek ,
David Zanders ,
Nils Boysen ,
Aleksander Kostka ,
Detlef Rogalla ,
Maren Kasischke,
Andreas Ostendorf,
Klaus Schierbaum ,
Anjana Devi
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Abstract
Crystalline MoS2 thin films are deposited via MOCVD using a new molybdenum precursor, 1,4-di-tert-butyl-1,4-diazabutadienyl-bis(tert-butylimido)molybdenum(vi) [Mo(NtBu)2(tBu2DAD)], and elemental sulfur.