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IOP Publishing, Japanese Journal of Applied Physics, SJ(59), p. SJJA01, 2020

DOI: 10.35848/1347-4065/ab8681

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Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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