Published in
Royal Society of Chemistry, Journal of Materials Chemistry C Materials for optical and electronic devices, 15(8), p. 5163-5173, 2020
DOI: 10.1039/c9tc06210f
Links
Tools
Oxygen incorporated solution-processed high-κ La2O3 dielectrics with large-area uniformity, low leakage and high breakdown field comparable with ALD deposited films
Journal article published in 2020 by
Longsen Yan,
Waner He,
Xiaoci Liang,
Chuan Liu,
Xihong Lu 
,
Chunlai Luo,
Aihua Zhang,
Ruiqiang Tao,
Zhen Fan ,
Min Zeng,
Honglong Ning ,
Guofu Zhou,
Xubing Lu ,
Junming Liu
,
Chunlai Luo,
Aihua Zhang,
Ruiqiang Tao,
Zhen Fan ,
Min Zeng,
Honglong Ning ,
Guofu Zhou,
Xubing Lu ,
Junming Liu
This paper was not found in any repository, but could be made available legally by the author.
Full text: Unavailable
Published version:
archiving forbidden
Data provided by 
Abstract
Oxygen incorporated solution-processed high-κ La2O3 dielectrics exhibit large-area uniformity, low leakage and high breakdown field comparable with ALD deposited films.