Published in
Royal Society of Chemistry, Journal of Materials Chemistry C Materials for optical and electronic devices, 30(6), p. 8051-8059
DOI: 10.1039/c8tc02243g
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Insights into the passivation effect of atomic layer deposited hafnium oxide for efficiency and stability enhancement in organic solar cells
Journal article published in 2018 by
Ermioni Polydorou,
Martha Botzakaki,
Charalampos Drivas,
Kostas Seintis,
Ilias Sakellis 
,
Anastasia Soultati,
Andreas Kaltzoglou ,
Thanassis Speliotis,
Mihalis Fakis ,
Leonidas C. Palilis ,
Stella Kennou,
Azhar Fakharuddin,
Lukas Schmidt-Mende ,
Dimitris Davazoglou,
Polycarpos Falaras
and other authors.
,
Anastasia Soultati,
Andreas Kaltzoglou ,
Thanassis Speliotis,
Mihalis Fakis ,
Leonidas C. Palilis ,
Stella Kennou,
Azhar Fakharuddin,
Lukas Schmidt-Mende ,
Dimitris Davazoglou,
Polycarpos Falaras
and other authors.
This paper was not found in any repository, but could be made available legally by the author.
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Abstract
Atomic layer deposition of HfO2 significantly increases the efficiency and prolongs the lifetime of organic solar cells.