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Royal Society of Chemistry, Physical Chemistry Chemical Physics, 24(20), p. 16861-16875

DOI: 10.1039/c8cp00210j

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Initial stage of atomic layer deposition of 2D-MoS2 on a SiO2 surface: a DFT study

Journal article published in 2018 by M. Shirazi ORCID, W. M. M. Kessels ORCID, A. A. Bol ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

In this study, we investigate the reactions involving Atomic Layer Deposition (ALD) of 2D-MoS2 from the heteroleptic precursor Mo(NMe2)2(NtBu)2 and H2S as the co-reagent on a SiO2(0001) surface by means of density functional theory (DFT).