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Royal Society of Chemistry, Physical Chemistry Chemical Physics, 24(20), p. 16861-16875
DOI: 10.1039/c8cp00210j
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Initial stage of atomic layer deposition of 2D-MoS2 on a SiO2 surface: a DFT study
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Abstract
In this study, we investigate the reactions involving Atomic Layer Deposition (ALD) of 2D-MoS2 from the heteroleptic precursor Mo(NMe2)2(NtBu)2 and H2S as the co-reagent on a SiO2(0001) surface by means of density functional theory (DFT).