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Royal Society of Chemistry, Nanoscale, 3(10), p. 1420-1431

DOI: 10.1039/c7nr07491c

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Environment-controlled sol–gel soft-NIL processing for optimized titania, alumina, silica and yttria-zirconia imprinting at sub-micron dimensions

Journal article published in 2018 by Thomas Bottein, Olivier Dalstein, Magali Putero, Andrea Cattoni ORCID, Marco Faustini, Marco Abbarchi, David Grosso ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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Abstract

Metal oxide (MOX) surface nanopatterns can be prepared using Soft-Nano-Imprint-Lithography (soft-NIL) combined with sol–gel deposition processing.