30 papers found
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Area Selective Polymer Brush Deposition
Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing
Fabrication of MoS 2 Nanowire Arrays and Layered Structures via the Self-Assembly of Block Copolymers
Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealing
Fabrication of ultra-dense sub-10 nm in-plane Si nanowire arrays by using a novel block copolymer method: optical properties
Reduction and control of domain spacing by additive inclusion: Morphology and orientation effects of glycols on microphase separated PS-b-PEO
A vertical lamellae arrangement of sub-16 nm pitch (domain spacing) in a microphase separated PS-b-PEO thin film by salt addition
An insitu hard mask block copolymer approach for the fabrication of ordered, large scale, horizontally aligned, Si nanowire arrays on Si substrate
Formation of sub-7 nm feature size PS-b-P4VP block copolymer structures by solvent vapour process
The Morphology of Ordered Block Copolymer Patterns as Probed by High Resolution Imaging
Fabrication of Ordered, Large Scale, Horizontally-Aligned Si Nanowire Arrays Based on an In Situ Hard Mask Block Copolymer Approach
Size and space controlled hexagonal arrays of superparamagnetic iron oxide nanodots: magnetic studies and application
Sub-10 nm Feature Size PS- b -PDMS Block Copolymer Structures Fabricated by a Microwave-Assisted Solvothermal Process
The sensitivity of random polymer brush-lamellar polystyrene-b-polymethylmethacrylate block copolymer systems to process conditions
Molecularly Functionalized Silicon Substrates for Orientation Control of the Microphase Separation of PS- b -PMMA and PS- b -PDMS Block Copolymer Systems
Fabrication of a sub-10 nm silicon nanowire based ethanol sensor using block copolymer lithography
Directed self-assembly of PS-b-PMMA block copolymer using HSQ lines for translational alignment
Fabrication of highly ordered sub-20 nm silicon nanopillars by block copolymer lithography combined with resist design
Orientation and Alignment Control of Microphase-Separated PS- b -PDMS Substrate Patterns via Polymer Brush Chemistry
ÔØØØ ÅÅÒÙ××ÖÖÔØ Block copolymer lithography: Feature size control and extension by an over-etch technique Block copolymer lithography: feature size control and extension by an over-etch technique
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