Papers authored by Giovanni Isella
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M. Stoffel,
A. Malachias,
T. Merdzhanova,
F. Cavallo,
G. Isella 
,
D. Chrastina,
H. von Känel,
A. Rastelli,
O. G. Schmidt
,
D. Chrastina,
H. von Känel,
A. Rastelli,
O. G. Schmidt
SiGe wet chemical etchants with high compositional selectivity and low strain sensitivity
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M. Bonfanti,
E. Grilli,
M. Guzzi,
M. Virgilio,
G. Grosso,
D. Chrastina,
G. Isella ,
H. von Kaenel,
A. Neels
,
H. von Kaenel,
A. Neels
Optical transitions in Ge/SiGe multiple quantum wells with Ge-rich barriers
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Maurizio Rondanini,
Carlo Cavallotti,
Daria Ricci,
Daniel Chrastina,
Giovanni Isella ,
Tamara Moiseev,
Hans Von Känel
,
Tamara Moiseev,
Hans Von Känel
An experimental and theoretical investigation of a magnetically confined dc plasma discharge
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D. J. Paul ,
G. Matmon,
L. Lever,
Z. Ikoni,
Z. Ikonic,
R. W. Kelsall,
D. Chrastina,
G. Isella ,
H. von Känel
,
G. Matmon,
L. Lever,
Z. Ikoni,
Z. Ikonic,
R. W. Kelsall,
D. Chrastina,
G. Isella ,
H. von Känel
Si/SiGe bound-to-continuum quantum cascade terahertz emitters
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A. Le Donne,
S. Binetti,
G. Isella ,
B. Pichaud,
M. Texier,
M. Acciarri,
S. Pizzini
,
B. Pichaud,
M. Texier,
M. Acciarri,
S. Pizzini
Structural characterization of nc-Si films grown by low-energy PECVD on different substrates
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M. Texier,
M. Acciarri,
S. Rinetti,
S. Binetti,
D. Cavalcoli ,
A. Cavallini,
D. Chrastina,
G. Isella ,
M. Lancin,
A. Le Donne,
A. Le Donne,
A. Tomasi,
B. Pichaud,
S. Pizzini,
Ag Cullis
and 2 other authors
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,
A. Cavallini,
D. Chrastina,
G. Isella ,
M. Lancin,
A. Le Donne,
A. Le Donne,
A. Tomasi,
B. Pichaud,
S. Pizzini,
Ag Cullis
and 2 other authors
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Douglas J. Paul ,
Guy Matmon,
Leon Lever,
Zoran Ikonic,
Robert Kelsall,
Daniel Chrastina,
Giovanni Isella ,
Hans Von Känel,
Elisabeth Müller,
Antonia Neels
,
Guy Matmon,
Leon Lever,
Zoran Ikonic,
Robert Kelsall,
Daniel Chrastina,
Giovanni Isella ,
Hans Von Känel,
Elisabeth Müller,
Antonia Neels
Si/SiGe Bound-to-Continuum Quantum Cascade Emitters
Download from eprints.gla.ac.uk
A. Le Donne,
S. Binetti,
G. Isella ,
S. Pizzini
,
S. Pizzini
Structural Homogeneity of nc-Si Films Grown by Low-Energy PECVD
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Johann Osmond,
Giovanni Isella ,
Daniel Chrastina,
Rolf Kaufmann,
Hans Von Känel
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,
Daniel Chrastina,
Rolf Kaufmann,
Hans Von Känel
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Alessia Le Donne,
Alessia Le Donne,
Simona Binetti,
Giovanni Isella ,
Bernard Pichaud,
Michael Texier,
A. Cavallini,
Maurizio Acciarri,
H. Richter,
Sergio Pizzini,
M. Kittler
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,
Bernard Pichaud,
Michael Texier,
A. Cavallini,
Maurizio Acciarri,
H. Richter,
Sergio Pizzini,
M. Kittler
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