Paul Lickiss
0000-0002-8507-9867
98 papers found
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Six-membered Rings with Two or More Heteroatoms with at least One Silicon to Lead
6-membered rings with 2 or more heteroatoms, at least one Si to Pb
EPR spectra of tris(trimethylsilyl)methyl(hydroxy)silyl radicals, (Me3Si)3CSi(R)OH˙, and of tris(trimethylsilyl)methylsilanone radical anions, (Me3Si)3CSi(R)O˙–(R = H, Me, Et, Bu, Ph, F)
Silicon derivatives of the metals of groups 1 and 2
The breakdown of polymeric tin fluorides under the influence of ultrasound
Rates of solvolysis of the compounds (Me3Si) 2(Ph2MeSi) CSiMe2X, X I, OSO2 CF3 and OCN. Mechanistic implications
Silicon oxygen compounds and siloxane polymers
Anchimeric Assistance in the Reactions of the Crowded Organosilicon Iodide (Me(3)si)(2)(ph(2)mesi)csime(2)i With Electrophiles
A study by gas-phase electron diffraction of tert-butyldimethylsilanol and its hemihydrate
Functions Containing at Least One Metalloid (Si, Ge, or B) and No Halogen, Chalcogen, or Group 15 Element; Also Functions Containing Four Metals
Reactions of the Highly Sterically Hindered Compounds (Me3si)3csime2x (X=cl, Br, I, or Ono2) With Nan3, Csf, Kscn, and Kocn in Meoh (Vol 460, Pg 7, 1993)
Preparation of the iodides (Me3Si)2C(SiMe2C6H4Y)(SiMe2I) and some related compounds
The plasma enhanced chemical vapour deposition of CuInSe2
Anchimeric assistance by the acetoxy group in the solvolysis of (Me3Si)2C(SiMe2-OCOMe)(SiMe2X), X = Cl, NCS or N3
A Study of the Effect of Processing Parameters on the Composition of CuInSe2 Thin Films Produced by Chemical Vapour Deposition
Reactions of the highly sterically hindered compounds (Me3Si)3CSiMe2X (X Cl, Br, I, or ONO2) with NaN3, CsF, KSCN, and KOCN in MeOH
Reactions of compounds of the type (Me3Si)2C(SiMe2C6H4Y)(SiMe2X) with trifluoroacetic acid
The chemical vapour deposition of indium and copper/indium alloys from metal hexafluoracetylacetonate complexes
The crystal structure of (HOMe2Si)2O
Structure of the highly crowded alkyne di[tris(trimethylsilyl)methyl]acetylene and the octasilane hexakis(trimethylsilyl)disilane
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