Miftakhul Huda
0000-0002-6200-7983
Meijo University
29 papers found
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Scalable eDIPS-based single-walled carbon nanotube films for conductive transparent electrodes in organic solar cells
Innentitelbild: Aerobic Toluene Oxidation Catalyzed by Subnano Metal Particles (Angew. Chem. 4/2019)
Inside Cover: Aerobic Toluene Oxidation Catalyzed by Subnano Metal Particles (Angew. Chem. Int. Ed. 4/2019)
Aerobic Toluene Oxidation Catalyzed by Subnano Metal Particles
Advanced nanofabrication and its application to nano phase-change memory for reducing writing current
Long Range Ordering of 5-nm-Sized Dot Arrays with a Pitch of <10 nm along EB-Drawn Guide Lines Using PS-PDMS Self-Assembly
Observation of Magnetic Nanodot Arrays Using Near-Field Polarization Microscope
Ordering of 6-nm-sized nanodot arrays with 10-nm-pitch using self-assembled block copolymers along electron beam-drawn guide-lines
Estimation of pattern resolution using NaCl high-contrast developer by Monte Carlo simulation of electron beam lithography
Controlling of 6 nm Sized and 10 nm Pitched Dot Arrays Ordered along Narrow Guide Lines Using PS-PDMS Self-Assembly
Fabrication of Carbon Nanodot Arrays with a Pitch of 20 nm for Pattern-Transfer of PDMS Self-Assembled Nanodots
Ordering of Self-Assembled Nanodots Improved by Guide Pattern with Low Line Edge Roughness for 5 Tbit/in.2 Patterned Media
Fabrication of 25-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Drawing, RIE and Ion-Milling
Fabrication of 6-nm-Sized Nanodot Arrays with 12 nm-Pitch along Guide Lines Using both Self-Assembling and Electron Beam-Drawing for 5 Tbit/in2 Magnetic Recording
Fabrication of CoPt Nanodot Array with a Pitch of 33 nm Using Pattern-Transfer Technique of PS-PDMS Self-Assembly
Attempts to form the 10-nm-order pitch of self-assembled nanodots using PS-PDMS block copolymer
Fabrication of 30-nm-Pitched CoPt Magnetic Dot Arrays Using 30-keV-Electron Beam Lithography and Ion Milling for Patterned Media
Pattern Transfer of 23-Nm-Diameter Block Copolymer Self-Assembled Nanodots Using CF4 Etching with Carbon Hard Mask (CHM) as Mask
Improved Observation Contrast of Block-Copolymer Nanodot Pattern Using Carbon Hard Mask (CHM)
Fabrication of 5-nm-Sized Nanodots Using Self-Assembly of Polystyrene–Poly(dimethylsiloxane)
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