Richard van de Sanden

Papers authored by Richard van de Sanden

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2014 A. P. H. Goede, W. A. Bongers, Graswinckel, R. M. C. M. Van De Sanden

, M. Leins, J. Kopecki, A. Schulz, M. Walker

Production of solar fuels by CO2 plasmolysis

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Alberto Perrotta, Erik R. J. van Beekum, Erj van Beekum, Gianfranco Aresta, Anu Jagia, Wytze Keuning, Richard M. C. M. van de Sanden

, Mcm Richard van de Sanden, Wmm Erwin Kessels, Erwin W. M. M. Kessels, Mariadriana Adriana Creatore

On the role of nanoporosity in controlling the performance of moisture permeation barrier layers

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2013 Moreno de Respinis, Gregory De Temmerman, Irem Tanyeli, Mauritius C. M. van de Sanden, Russ P. Doerner, Matthew J. Baldwin, Roel van de Krol

Efficient Plasma Route to Nanostructure Materials: Case Study on the Use of m-WO3 for Solar Water Splitting

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2011 Erwin Kessels, Harald Profijt, Stephen Potts, Richard van de Sanden

Plasma Atomic Layer Deposition

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2012 Ahm Arno Smets, Arno H. M. Smets, Michael A. Wank, Ma Michael Wank, Rene A. C. M. M. van Swaaij, Bas Vet, Marinus Matthias Fischer, Racmm René van Swaaij, Miro Zeman, Richard M. C. M. van de Sanden

, Dc David Bobela, David C. Bobela, Cr Christopher Wronski, Christopher R. Wronski, Mcm Richard van de Sanden

The relation between the bandgap and the anisotropic nature of hydrogenated amorphous silicon

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2011 Ma Michael Wank, Michael A. Wank, Rene van Swaaij, Richard van de Sanden

, Racmm René van Swaaij, Mcm Richard van de Sanden, Miro Zeman

Hydrogenated amorphous silicon p–i–n solar cells deposited under well controlled ion bombardment using pulse-shaped substrate biasing

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Mohamed Saadaoui, H. Henk van Zeijl, Wha Wim Wien, Wilhelmus H. A. Wien, Htm Hoa Pham, Hoa T. M. Pham, Cees Kwakernaak, Hcm Harm Knoops, Harm C. M. Knoops, Wilhelmus M. M. Erwin Kessels, Richard M. C. M. van de Sanden

, Wmm Erwin Kessels, Mcm Richard van de Sanden, Frans C. Voogt, Fc Frans Voogt and 2 other authors

Enhancing the wettability of high aspect-ratio through-silicon vias lined with LPCVD silicon nitride or PE-ALD titanium nitride for void-free bottom-up copper electroplating

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Tar Terje Hansen, Terje A. R. Hansen, Richard van de Sanden

, Mcm Richard van de Sanden, Rah Richard Engeln

H2 : the critical juncture between polymerization and dissociation of hydrocarbons in a low-temperature plasma

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2010 Ma Michael Wank, M. A. Wank, R. A. C. M. M. van Swaaij

, Racmm René van Swaaij, P. Pavel Kudlacek, M. C. M. van de Sanden, Mcm Richard van de Sanden, M. Miro Zeman

Hydrogenated amorphous silicon deposited under accurately controlled ion bombardment using pulse-shaped substrate biasing

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This paper is made freely available by the publisher.

Mauritius C. M. Richard van de Sanden

Views on Macroscopic Kinetics of Plasma Polymerization: Acrylic Acid Revisited

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Nicolaas J. Kramer, Elmer Sachteleben, Gozde Ozaydin-Ince, Richard van de Sanden

, Karen K. Gleason

Shape Memory Polymer Thin Films Deposited by Initiated Chemical Vapor Deposition

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Se Stephen Potts, M. C. M. van de Sanden, Stephen E. Potts, Luc R. J. G. Van den Elzen

, Lrjg Luc van den Elzen, Gijs Dingemans, Erik Langereis, Wytze Keuning, Mcm Richard van de Sanden, M. C. Van de Sanden, Wmm Erwin Kessels, W. M. M. Kessels

Low temperature plasma-enhanced atomic layer deposition of metal oxide thin films

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Ma Michael Wank, M. A. Wank, A. Andrea Illiberi, Fd D. Tichelaar, R. A. C. M. M. van Swaaij

, M. C. M. van de Sanden, Racmm René van Swaaij, Mcm Richard van de Sanden, M. Miro Zeman

Influence of hydrogen dilution on surface roughness development of a-Si:H thin films grown by remote plasma deposition

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2009 It Ina Martin, I. T. Martin, Ma Michael Wank, M. A. Wank, M. A. Blauw, R. A. C. M. M. van Swaaij

, Ma Michiel Blauw, Racmm René van Swaaij, Wmm Erwin Kessels, W. M. M. Kessels, M. C. M. van de Sanden, Mcm Richard van de Sanden

The effect of low frequency pulse-shaped substrate bias on the remote plasma deposition of a-Si: H thin films

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Ma Michael Wank, M. A. Wank, Racmm René van Swaaij, R. A. C. M. M. van Swaaij

, M. C. M. van de Sanden, Mcm Richard van de Sanden

On the surface roughness development of hydrogenated amorphous silicon deposited at low growth rates

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Michael A. Wank, René van Swaaij

, M. van de Sanden

Ion Assisted ETP-CVD a-Si:H at Well Defined Ion Energies

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2008 Fred Roozeboom, Michiel A. Blauw, Yann Lamy, E. Grunsven, Eric van Grunsven, Wouter Dekkers, Jan F. Verhoeven, Eric(F.) F. van den Heuvel, Emile van der Drift, Erwin (W M. M.) Kessels, E. W. M. M. Kessels, Richard (M C. M.) van de Sanden, R. M. C. M. van de Sanden

Deep Reactive Ion Etching of Through Silicon Vias

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2007 Wmm Erwin Kessels, Kessels Wmm, Heil Sbs, Sbs Stephan Heil, Erik Langereis, Hans van Hemmen, Jl Hans van Hemmen, Hemmen van Jl, Knoops Hcm, Hcm Harm Knoops, Richard van de Sanden

, Wytze Keuning, Sanden van de Mcm, Mcm Richard van de Sanden

Opportunities for plasma-assisted atomic layer deposition

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F. Fred Roozeboom, Jh Johan Klootwijk, Eric van den Heuvel, Jfc Jan Verhoeven, Fc van den Heuvel, Hans van Hemmen, Wouter Dekkers, Sbs Stephan Heil, Richard van de Sanden

, Jl Hans van Hemmen, Mcm Richard van de Sanden, Wmm Erwin Kessels, F. Le Cornec, F. LeCornec, L. Guiraud and 5 other authors

ALD options for Si-integrated ultrahigh-density decoupling capacitors in pore and trench designs

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Michael Wank, R. A. C. M. M. van Swaaij

, M. C. M. van de Sanden

Manipulating the Hydrogen-Bonding Configuration in ETP-CVD a-Si:H

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Papers authored by Richard van de Sanden