Nicolas Martin - Dissemin

Papers authored by Nicolas Martin

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2003 J. Lintymer, J. Gavoille, N. Martin

, J. Takadoum

Glancing angle deposition to modify microstructure and properties of sputter deposited chromium thin films

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Jean-Marie Chappé, Nicolas Martin

, Guy Terwagne, Jan Lintymer, Joseph Gavoille, Jamal Takadoum, Jamal Takadouma

Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering

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J. Takadoum, J. Y. Rauch, J. M. Cattenot, N. Martin

Comparative study of mechanical and tribological properties of CNx and DLC films deposited by PECVD technique

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Peter Hones, Nicolas Martin

, Manfred Regula, Francis L vy

Structural and mechanical properties of chromium nitride, molybdenum nitride, and tungsten nitride thin films

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2002 J. Y. Rauch, Christophe Rousselot, Nicolas Martin

Structure and composition of TixAl1−xN thin films sputter deposited using a composite metallic target

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2001 N. Martin

, O. Banakh, A. M. E. Santo, S. Springer, R. Sanjinés, J. Takadoum, F. Lévy

Correlation Between Processing and Properties of TiOxNy Thin Films Sputter Deposited by the Reactive Gas Pulsing Technique

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Christophe Rousselot, Nicolas Martin

Influence of two reactive gases on the instabilities of the reactive sputtering process

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N. Martin

, R. Sanjinés, J. Takadoum, F. Lévy

Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing technique

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N. Martin

, A. M. E. Santo, R. Sanjinés, F. Lévy

Energy distribution of ions bombarding TiO2 thin films during sputter deposition

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2000 Nicolas Martin

, Alain R. Bally, Peter Hones, Rosendo Sanjinés, Francis Lévy

High rate and process control of reactive sputtering by gas pulsing: The Ti-O system

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Nicolas Martin

, Alain R. Bally, Rosendo Sanjinés, Francis Lévy

Intrinsic low energy bombardment of titanium chromium oxide thin films prepared by reactive sputtering

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Anne Thobor, Christophe Rousselot, Christine Clement, Jamal Takadoum, Nicolas Martin

, Rosendo Sanjines, Francis Levy

Enhancement of mechanical properties of TiN/AlN multilayers by modifying the number and the quality of interfaces

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Nicolas Martin

, Christophe Rousselot

Prediction of the periods of multilayers prepared by multitarget sputtering

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J. Y. Rauch, C. Rousselot, N. Martin

, C. Jacquot, J. Takadoum

Characterization of (Ti1-xAlx)N films prepared by radio frequency reactive magnetron sputtering

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1999 Nicolas Martin

, Christophe Rousselot

Modelling of reactive sputtering processes involving two separated metallic targets

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A. Thobor, C. Rousselot, J. Takadoum, N. Martin

Influence of periodicity and bias effect on mechanical properties of TiN/AlN multilayered coatings

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Nicolas Martin

, Christophe Rousselot

Instabilities of the reactive sputtering process involving one metallic target and two reactive gases

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C. Rousselot, N. Martin

Hysteresis effect in D.C. and R.F. reactive magnetron sputtering

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1998 Nicolas Martin

, Christophe Rousselot

Use of a theoretical model to investigate RF and DC reactive sputtering of titanium and chromium oxide coatings

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Nicolas Martin

, Dominique Baretti, Christophe Rousselot, Jean-Yves Rauch

The Effect of Bias Power on Some Properties of Titanium and Titanium Oxide Films Prepared by r.f. Magnetron Sputtering

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Papers authored by Nicolas Martin