Kazuhiro Karahashi
0000-0001-9951-6573
5 papers found
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High-throughput SiN ALE: surface reaction and ion-induced damage generation mechanisms
Foundations of atomic-level plasma processing in nanoelectronics
Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Stability of hexafluoroacetylacetone molecules on metallic and oxidized nickel surfaces in atomic-layer-etching processes
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