Researcher
Eugenio Dentoni Litta
Royal Institute of Technology
Statistics
22 papers found
All papers authored by Eugenio Dentoni Litta
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Olalla Varela Pedreira,
Goutham Arutchelvan,
Houman Zahedmanesh,
Katia Devriendt ,
Hans Mertens,
Zheng Tao ,
Romain Ritzenthaler ,
Shouhua Wang,
Dunja Radisic,
Karine Kenis,
Lieve Teugels,
Farid Sebai,
Christophe Lorant ,
Nicolas Jourdan
and 42 other authors
Buried Power Rail Integration With FinFETs for Ultimate CMOS Scaling
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Raghu Hathwar,
Mattan Kamon,
Joseph Ervin,
Tom Schram ,
Thomas Chiarella,
Steven Demuynck,
Sylvain Baudot,
Yong Kong Siew,
Stenfan Kubicek,
Eugenio Dentoni Litta ,
SoonAik Chew,
Jerome Mitard
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Eugenio Dentoni Litta,
Per-Erik Hellstrom,
Mikael Ostling
Download from dx.doi.org
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S. Hall,
M. Althobaiti,
D. Hesp,
V. R. Dhanak,
A. Santoni,
A. D. Weerakkody,
N. Sedghi,
P. R. Chalker ,
C. Henkel ,
E. Dentoni Litta ,
P.-E. Hellström,
M. Östling ,
H. Tan,
S. Schamm-Chardon
Atomic-layer deposited thulium oxide as a passivation layer on germanium
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Per-Erik Hellstrom
Recent advances in high-k dielectrics and inter layer engineering
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,
Per-Erik Hellstrom,
Mikael Ostling
Improved low-frequency noise for 0.3nm EOT thulium silicate interfacial layer
Download from kth.diva-portal.org
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Mikael Ostling
Interfacial Layer Engineering Using Thulium Silicate/Germanate for High-k/Metal Gate MOSFETs
Download from iopscience.iop.org
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Dimitra Tsoutsou,
Athanasios Dimoulas,
Christoph Henkel,
Mikael Östling,
Eugenio Dentoni Litta ,
Per-Erik Hellstrom,
M. Ostling
(Invited) Interface Engineering Routes for a Future CMOS Ge-Based Technology
Download from iopscience.iop.org
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Per-Erik Hellstrom,
Christoph Henkel,
Mikael Ostling
Thulium Silicate Interfacial Layer for Scalable High-k/Metal Gate Stacks
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,
P. E. Hellstrom,
M. Ostling
A study of low-frequency noise on high-k/metal gate stacks with in situ SiOx interfacial layer
Download from kth.diva-portal.org
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