Nils Boysen
0000-0002-6931-8506
Ruhr University Bochum
6 papers found
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High-Performance Iridium Thin Films for Water Splitting by CVD Using New Ir(I) Precursors
Unveiling Ruthenium(II) Diazadienyls for Gas Phase Deposition Processes: Low Resistivity Ru Thin Films and Their Performance in the Acidic Oxygen Evolution Reaction
A carbene stabilized precursor for the spatial atomic layer deposition of copper thin films
A new metalorganic chemical vapor deposition process for MoS2 with a 1,4-diazabutadienyl stabilized molybdenum precursor and elemental sulfur
Ein N‐heterocyclischer Carbenkomplex des Silbers für die plasmaunterstützte räumlich getrennte Atomlagenabscheidung dünner Silberschichten bei Atmosphärendruck
An N-Heterocyclic Carbene Based Silver Precursor for Plasma-Enhanced Spatial Atomic Layer Deposition of Silver Thin Films at Atmospheric Pressure
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