Tai Chen Kuo
0000-0003-0270-5461
4 papers found
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Effect of annealing conditions on dopants activation and stress conservation in silicon-germanium
Neutral beam and ICP etching of HKMG MOS capacitors: Observations and a plasma-induced damage model
Effect of microwave annealing on electrical characteristics of TiN/Al/TiN/HfO2/Si MOS capacitors
A study on the plating and wetting ability of ruthenium-tungsten multi-layers for advanced Cu metallization
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