Hartmut Bracht
0000-0003-3700-6687
Westfälische Wilhelms-Universität
4 papers found
Refreshing results…
Retarded boron and phosphorus diffusion in silicon nanopillars due to stress induced vacancy injection
Defect distribution in boron doped silicon nanostructures characterized by means of scanning spreading resistance microscopy
Diffusion of boron in germanium at 800–900 °C revisited
Fluctuation electron microscopy on silicon amorphized at varying self ion-implantation conditions
Missing publications? Search for publications with a matching author name.