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Generating stationary electron beams by a forevacuum plasma source at pressures up to 100 Pa
Download from www.researchgate.netLow cost ion implantation technique
Download from www.researchgate.netExpansion of the working range of forevacuum plasma electron sources toward higher pressures
Download from www.researchgate.netElectrostatic plasma lens for focusing negatively charged particle beams
Download from www.researchgate.netMolecular phosphorus ion source for semiconductor technology
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