Carlos Fonseca
0000-0002-2759-0384
Universidade do Porto Faculdade de Engenharia
50 papers found
Refreshing results…
In situ characterization of the p-Si/NH4F interface during dissolution in the current oscillation regime
In Situ Infrared Study of the Oscillating Anodic Dissolution of Silicon in Fluoride Electrolytes
In situ spectrochemical study of the anodic dissolution of silicon by potential-difference and electromodulated FT-IR spectroscopy
In Situ FT-IR Study of the Interfacial Oxide in the Anodic Dissolution of Silicon
In situ infrared characterisation of the interfacial oxide during the anodic dissolution of a silicon electrode in fluoride electrolytes
Characterisation of Titanium Anodic Oxides by X Ray Absorption Spectroscopy and GXRD
Characterisation of titanium passivation films by in situ ac impedance measurements and XPS analysis
Modelling of the impedance behaviour of an amorphous semiconductor schottky barrier in high depletion conditions. Application to the study of the titanium anodic oxide/electrolyte junction
Caractérisation In-situ de la Structure Electronique d'un Film d'Oxydation Anodique du Titane par Mesures de Capacité
Etude par Impédance des Films de Passivation Formés sur le Titane en Milieu Sulfurique
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