Silicone rubber films with graded and localized mechanical properties are prepared using two-part polydimethylsiloxane (PDMS) elastomer, photoinhibitor compounds and conventional photolithography. First the un-cross-linked PDMS is mixed with benzophenone. The resulting positive photosensitive material is then exposed through a mask to UV light from a conventional mask aligner. Cross-linking of the UV exposed elastomer is inhibited, leading to softer regions than the surrounding unexposed matrix. By empirically fitting the nonlinear, hyperelastic Mooney-Rivlin model to experimentally measured stress-strain curves we determine the equivalent tensile modulus (E) of the rubber film. We show the PDMS tensile modulus can then be adjusted in the 0.65-2.9 MPa range by decreasing the UV exposure dose (from 24 000 to 0 mJ cm-2). Further, using a patterned UV mask, we can locally define differential regions of tensile modulus within a single PDMS rubber film. We demonstrate that ``hard islands'' (E ~ 2.9 MPa) of 100 mum minimum diameter can be patterned within a 100-mum-thick, single ``soft'' PDMS rubber membrane (E ~ 0.65 MPa) cured at 150 °C for 24 h. Thin gold film conductors patterned directly onto the photopatterned PDMS are stretchable and withstand uniaxial cycling to tens of percent strain. The mechanically ``pixellated'' PDMS rubber film provides an improved substrate with built-in strain relief for stretchable electronics.