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American Institute of Physics, Applied Physics Letters, 12(111), p. 122109

DOI: 10.1063/1.5004514

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Highly stable amorphous zinc tin oxynitride thin film transistors under positive bias stress

Journal article published in 2017 by K. M. Niang, B. C. Bayer, J. C. Meyer, A. J. Flewitt ORCID
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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