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Nanoengineering: Fabrication, Properties, Optics, and Devices XIV

DOI: 10.1117/12.2272702

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Innovative patterning method for modifying few-layer MoS2 device geometries

This paper was not found in any repository; the policy of its publisher is unknown or unclear.
This paper was not found in any repository; the policy of its publisher is unknown or unclear.

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