Published in
American Institute of Physics, Applied Physics Letters, 6(111), p. 063105
DOI: 10.1063/1.4986991
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Through-membrane electron-beam lithography for ultrathin membrane applications
Journal article published in 2017 by
M. Neklyudova 
,
A. K. Erdamar,
L. Vicarelli,
S. J. Heerema,
T. Rehfeldt ,
G. Pandraud,
Z. Kolahdouz ,
C. Dekker,
H. W. Zandbergen
,
A. K. Erdamar,
L. Vicarelli,
S. J. Heerema,
T. Rehfeldt ,
G. Pandraud,
Z. Kolahdouz ,
C. Dekker,
H. W. Zandbergen
This paper is available in a repository.
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