Published in
American Institute of Physics, Journal of Applied Physics, 4(122), p. 043304
DOI: 10.1063/1.4996186
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Dynamics of processes during the deposition of ZrO2 films by controlled reactive high-power impulse magnetron sputtering: A modelling study
Journal article published in 2017 by
Tomáš Kozák 
,
Jaroslav Vlček
,
Jaroslav Vlček
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