Published in
2017 International Conference of Microelectronic Test Structures (ICMTS)
DOI: 10.1109/icmts.2017.7954274
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High voltage MOSFETs integration on advanced CMOS technology: Characterization of thick gate oxides incorporating high k metal gate stack from logic core process
Proceedings article published in 2017 by
Dann Morillon,
Franck Julien 
,
Jean Coignus,
Alain Toffoli,
Loic Welter,
Carine Jahan,
Jean-Philippe Reynard,
Emmanuel Richard,
Pascal Masson
,
Jean Coignus,
Alain Toffoli,
Loic Welter,
Carine Jahan,
Jean-Philippe Reynard,
Emmanuel Richard,
Pascal Masson
