Published in
Springer (part of Springer Nature), Applied Physics A: Materials Science and Processing, 4(123)
DOI: 10.1007/s00339-017-0870-0
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Lattice location of implanted Co in heavily doped $n^+$ n + - and $p^+$ p + -type silicon
Journal article published in 2017 by
Daniel José da Silva 
,
Ulrich Wahl,
João Guilherme Correia,
Lígia Marina Amorim,
Manuel Ribeiro da Silva,
Lino Miguel da Costa Pereira,
João Pedro Araújo
,
Ulrich Wahl,
João Guilherme Correia,
Lígia Marina Amorim,
Manuel Ribeiro da Silva,
Lino Miguel da Costa Pereira,
João Pedro Araújo
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