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Society of Photo-optical Instrumentation Engineers, Journal of Micro/Nanolithography, MEMS, and MOEMS, 1(16), p. 014001

DOI: 10.1117/1.jmm.16.1.014001

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X-ray scattering critical dimensional metrology using a compact x-ray source for next generation semiconductor devices

Journal article published in 2017 by R. Joseph Kline, Daniel F. Sunday ORCID, Donald Windover, Benjamin D. Bunday
This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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